ELFT HÍRADÓ

[Horváth Zsolt Endre <horvath.zsolt.endre AT ek.hun-ren.hu>]

Kedves Kollégák!


Ez az előadás ma délelőtt lesz:


Figyelem, a szokásostól eltérő időpont!


2025 június 19-én, csütörtökön 10 órakor kerül sor a KFKI 26. épület, 1. 
emeleti tanácsteremben
Prof. Liang-Chia Chen (Precision Metrology Laboratory, National Taiwan 
University)


"Advancements in Optical Metrology for Advanced Semiconductor Packaging"

című előadására.


ABSTRACT:
In the wake of continuous miniaturization, optical metrology has 
solidified its role
as an essential instrument in semiconductor manufacturing, chiefly due 
to its non-
invasive, high-precision, and rapid measurement capacities. Particularly 
crucial in
advanced techniques such as automated optical inspection (AOI), its 
significance
grows with the rising demand for accurate 3D integrated circuit packaging
characterization. This introduces notable challenges for optical 
metrology, which need
addressing to meet rigorous in-line process demands. This talk aims to 
present an
overview of key measurement methods in semiconductor fabrication, 
encompassing
CD-SEM, X-ray or EUV scatterometry, reflectometry for optical critical 
dimension (OCD)
metrology, AFM, advanced optics, white light interferometry, and 
confocal microscopy.
The talk will share insights into the intrinsic limitations of these 
techniques, potential
future innovations, and recent advancements in optical metrology. The 
session will
conclude with a perspective on the evolution of these techniques amidst 
the prevailing
technological constraints.



Minden érdeklődőt szívesen látunk!

Horváth Zsolt Endre
Szeminárium koordinátor

--
Dr. Zsolt E. HORVÁTH
Institute for Technical Physics and Materials Science,
Centre for Energy Research
(EK MFA)
Konkoly Thege Rd. 29-33, 1121 Budapest,
Mail: P.O.Box 49, H-1525 Budapest, Hungary
Phone: +36-1-392-2680, Fax: +36-1-392-2226
e-mail:horvath.zsolt.endre AT ek.hun-ren.hu