ELFT HÍRADÓ

[Szeminárium koordinátor <pusztai.tamas AT wigner.hun-ren.hu>]

SZFI SeminarRanna MasheyevaHUN-REN Wigner RCP SZFIQuantifying Plasma–Surface 
InteractionsTuesday, 27 October 2026, 10:00, KFKI Campus, Bldg. 1, 2nd floor, 
Conference RoomLow-temperature plasmas are widely used in many technological 
applications, including plasma processing, surface modification, thin-film 
deposition, and microelectronics. In these systems, plasma–surface 
interactions play a fundamental role in determining the discharge 
characteristics. While energetic plasma particles continuously modify the 
electrode surfaces, the surfaces simultaneously affect the plasma through 
processes such as secondary electron emission and electron reflection. 
Therefore, an accurate understanding and quantification of plasma–surface 
interaction processes are essential for both plasma diagnostics and 
predictive plasma modeling.Among the various plasma–surface interaction 
processes, secondary electron emission has a particularly strong influence on 
electron heating, ionization, and discharge sustainment. However, the 
effective secondary electron emission coefficient, γ, is not solely 
determined by the electrode material but also depends on the gas, discharge 
conditions, and the actual state of the surface. As a result, values measured 
in beam experiments often differ from those under realistic plasma operating 
conditions, making the in-situ determination of γ an important and 
challenging task.We have developed an in-situ diagnostic method [1] to 
determine the effective secondary electron emission coefficient by combining 
measurements with simulations. The method was first investigated 
computationally and subsequently validated experimentally for argon plasmas 
[2]. More recently, it has been extended to helium and neon discharges, 
demonstrating its applicability over a wider range of operating conditions 
[3].References:[1] Masheyeva R U, Dzhumagulova K N, Myrzaly M, Schulze J and 
Donkó Z 2021 AIP Adv. 11 075024[2] Masheyeva R U, Hartmann P, Luo L-Y, 
Dzhumagulova K, Liu Y-X, Schulze J and Donkó Z 2025 J. Phys. D: Appl. Phys. 
58 045208[3] Masheyeva R U, Derzsi A, Dzhumagulova K, Myrzaly M, Donkó Z and 
Hartmann P 2026 J. Phys. D: Appl. Phys. 59 105201. Minden érdeklődőt 
szívesen látunk! - Everyone is welcome to attend.Tamás 
Pusztaipusztai.tamas AT wigner.hun-ren.hu