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PhD házivédésHorváth BenedekMTA Wigner FK SZFIControl of particle properties 
in low-pressure radio frequency gas discharges2023. július 11. kedd, 10.00, 
KFKI Telephely, I. épület 1. emeleti TanácsteremCapacitively coupled plasmas 
(CCPs) are widely applied in modern plasma processing technologies like 
etching, deposition and cleaning. The substrate located on one of the 
electrodes undergoes bombardment by plasma particles, so the control of the 
energy and the flux of these particles at the electrodes, which determine the 
various surface processes, is crucial. A detailed understanding of the 
complex physics of CCPs facilitates the knowledge-based optimization of 
plasma processing applications.The current thesis aims the fundamental 
understanding of low-pressure CCPs operated under various conditions. The 
electron power absorption and ionization dynamics and the role of surface 
processes in CCPs are addressed, combining particle-based computational 
studies with experiments. The accurate modelling of various surface processes 
in particle-in-cell/Monte Carlo collisions simulations of CCPs is in focus of 
this work. New details of the electron power absorption and the ionization 
dynamics in CCPs are discovered, and the effects of various surface processes 
on the plasma parameters are revealed. Unkown surface coefficients are 
determined and the applicability of spectroscopic methods to probe the 
discharge operation mode is also investigated. Moreover, efficient control of 
the sputtering yield is achieved in low-pressure CCPs, which can facilitate 
the optimization of plasma processing applications based on fundamental 
understanding of the dynamics of CCPs.[1] B Horváth, A Derzsi, J Schulze, I 
Korolov, P Hartmann, Z Donkó 2020 Plasma Sources Science and Technology 29 
055002[2] B Horváth, Z Donkó, J Schulze, A Derzsi 2022 Plasma Sources Science 
and Technology 31 045025[3] A Derzsi, B Horváth, Z Donkó, J Schulze 2020 
Plasma Sources Science and Technology 29 074001 Minden érdeklődőt 
szívesen látunk! - Everyone is welcome to attend.Nagy Attilasem-admin AT szfki.hu