ELFT HÍRADÓ

[Szeminárium koordinátor <sem-admin AT szfki.hu>]

SZFI SeminarHorváth BenedekWigner RCP SZFIThe role of surface processes in 
low-pressure Capacitively Coupled PlasmasTuesday, 26 October 2021, 10:00, 
Bldg 1., auditorium, 
https://teams.microsoft.com/l/meetup-join/19%3ace423c05cd1543ab9f9905886590ad69%40thread.tacv2/1634642706945?context=%7b%22Tid%22%3a%224d7ddeef-14ff-4911-8c11-401c69384d77%22%2c%22Oid%22%3a%22969d2d4a-5ba8-43f1-bd69-93f0998b025f%22%7dLow-pressure
 Capacitively Coupled Plasmas (CCPs) are common plasma sources in laboratory, 
which are of interest of both academic research and technological 
applications. These systems are driven by a radio-frequency voltage, which 
results in a stationary state of the plasma parameters with a periodic 
modulation. The Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) kinetic 
simulation method is a widely applied tool for the computational study of 
CCPs. While many efforts have been taken to model the gas phase processes of 
CCPs precisely in PIC/MCC simulations, the surface processes are often 
neglected or considered with rough simplifications in such simulations. By 
using various surface models in the simulations of low-pressure CCPs operated 
in electropositive and electronegative gases, a dramatic effect of using 
realistic surface models on the PIC/MCC simulation results was revealed (B 
Horváth et. al. 2017 Plasma Sources Sci. Technol. 26 124001; B Horváth et. 
al. 2018 J. Phys. D: Appl. Phys. 51 355204). This work is presented in this 
talk, as well as a computationally assisted spectroscopic technique used to 
determine the ion-induced secondary electron emission coefficient of the 
stainless steel electrodes in a neon CCP (B Horváth et. al. 2020 Plasma 
Sources Sci. Technol. 29 055002).  Minden érdeklődőt szívesen látunk! - 
Everyone is welcome to attend.Róbert Juhászsem-admin AT szfki.hu