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[Fizinfo] MEMSWAVE Workshop


Chronological Thread 
  • From: HORVATH Zsolt Jozsef <horvzsj AT mfa.kfki.hu>
  • To: mfa AT falka.mfa.kfki.hu, fizinfo AT sunserv.kfki.hu, fizinfo AT sunserv.kfki.hu
  • Subject: [Fizinfo] MEMSWAVE Workshop
  • Date: Wed, 25 Oct 2000 15:50:55 +0200
  • List-id: ELFT HRAD <fizinfo.lists.kfki.hu>

MEGHIVO

Tisztelt Kollegak!

Oktober 27-en penteken 9-13 ora kozott angol nyelvu rendezvényt tartunk az
MTA MFA tanacstermeben (Budapest XII., Konkoly Thege Miklos u. 29-33, 26.
epulet, I. emelet). A rendezveny cime:

2nd Workshop on Micromachined Circuits for Microwave and Millimeter Wave
Applications "MEMSWAVE" - II

A rendezvényen minden erdeklodot orommel latunk. Bovebb tajekoztatas
erdekeben mellekelem az "Extended Abstracts" kotet eloszavat.

Tisztelettel:
Horvath Zsolt Jozsef


Foreword

The first "MEMSWAVE" Workshop was held in Bucharest in 1999. It is our
pleasure
to organize the 2nd Workshop on Micromachined Circuits for Microwave and
Millimeter
Wave Applications in Budapest. The aim of the Workshop has not changed
since the last year.
It is the review and discussion of the recent results obtained in the frame
of the COPERNICUS
Project No. 977131 called by the same name. The Workshop provides
possibility for additional
deeper discussions in a more informal way, than they can be carried out in
Project Meetings.
The main goal of the Project is to develop the technological process
for
microwave
circuits prepared on micromachined insulator membranes as mechanical
supports. This
development involves a wide basic research in many fields of semiconductor
device physics and
technology. For example, the insulator membranes are prepared on Si or GaAs
substrates by
growing an insulator film with a thickness of 2-3 microm, and removing
(etching) the substrate in
the areas where the microwave circuits are prepared. Both the electrical
and mechanical
properties of the membranes including reliability have to be suitable. For
this purpose the effect
of the composition of the insulator film, the effect of the growth
parameters, and the effect of
the etching process on the properties of the films have to be studied. On
the other hand, for
studying the properties of membranes, new experimental methods have also to
be developed or
the existing methods have to be improved. The development and measurement
of microwave
circuits prepared on the membranes require even more robust and complex
research work.
Consequently, the lectures to be presented at the Workshop will deal
with
the
development of the membranes, of different microwave devices and circuits
(including filters
working at frequencies of 38 and 77 GHz), their reliability issues and
measurements
techniques.
We welcome you to Budapest, to our Institute, and wish you to have
useful
and
pleasant time during the Workshop.

Budapest, October 13, 2000.

The Organizing Committee:

Zs. J. Horváth
Zs. Püspöki
B. Szentpáli








  • [Fizinfo] MEMSWAVE Workshop, HORVATH Zsolt Jozsef, 10/25/2000

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